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Foreword |
5 |
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Preface |
8 |
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Contents |
10 |
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Abbreviations |
17 |
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1. History of Phase Change Memories |
21 |
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1.1 The Discovery of Phase Change Materials |
21 |
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1.2 Early Electronic Computers and Memory Systems |
22 |
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1.3 Pioneers in Phase Change Memory |
24 |
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1.4 Early Attempts with Phase Change Memory |
29 |
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1.5 Rebirth of Phase Change Memory |
30 |
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References |
34 |
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Part I:Material Science: Theoryand Experiment |
35 |
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2. Density Functional Theory Calculations for Phase Change Materials |
36 |
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2.1 Introduction |
36 |
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2.2 The Theorem of Hohenberg and Kohn |
37 |
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2.3 The Kohn-Sham Equation |
39 |
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2.4 The Local Density Approximation |
41 |
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2.5 Beyond Density Functional Theory |
42 |
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2.6 Application of DFT in the Field of Phase Change Materials |
43 |
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2.6.1 Structure Determination |
44 |
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2.6.2 Electronic Properties |
48 |
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References |
55 |
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3. Nature of Glasses |
58 |
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3.1 Introduction |
58 |
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3.2 Thermodynamics of the Glass Transition |
60 |
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3.3 Glass Transition from Dynamics |
62 |
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3.4 Glass Forming Tendency |
63 |
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3.4.1 Compositional Trends of the Glass TransitionTemperature |
65 |
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3.5 Calorimetric Measurement of the Glass Transition Temperature and Related Thermal Properties |
67 |
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3.6 Three Generic Classifications of Glasses and Glass Transitions |
70 |
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3.7 Elastic Phases in Ionic and Super-ionic Glasses |
73 |
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3.8 Ideal Glasses and Self-organization of Networks |
73 |
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3.9 Does the View Below the Glass Transition Temperature Correlate with the View above the Glass Transition Temperature? |
75 |
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3. 10 Glass Formation in Hydrogen Bonded Networks |
76 |
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3.11 Epilogue |
78 |
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References |
78 |
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4. Structure of Amorphous Ge-Sb-Te Solids |
82 |
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4.1 Introduction |
82 |
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4.2 Structural Order in Amorphous Materials |
83 |
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4.2.1 Short-range Order |
83 |
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4.2.2 Medium-range Order |
84 |
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4.2.3 Long-range Structure |
85 |
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4.3 Experimental Structural Probes |
86 |
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4.4 Structural Modeling |
87 |
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4.5 The Structure of Amorphous Phase-change Materials |
88 |
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4.5.1 Experimental Studies |
88 |
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4.5.2 Simulational Studies |
91 |
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4.6 Summary |
97 |
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References |
98 |
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5. Experimental Methods for Material Selection in Phase-change Recording |
100 |
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5.1 Introduction |
100 |
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5.2 Reversible Switching |
101 |
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5.3 Phase-change Materials |
103 |
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5.3.1 Crystallization by Nucleation and Growth |
105 |
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5.3.2 Crystallization Dominated by Crystal Growth |
107 |
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5.4 Archival Life Stability |
108 |
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5.5 Crystallization Rate |
110 |
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5.6 Material Optimization |
112 |
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5.7 Outlook |
116 |
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References |
117 |
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6. Scaling Properties of Phase Change Materials |
118 |
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6.1 Introduction |
118 |
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6.2 Thin Films of Phase Change Materials |
119 |
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6.2.1 Crystallization Temperature as a Function of Film Thickness |
120 |
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6.2.2 Crystallization Rate as a Function of Film Thickness |
124 |
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6.2.3 Change in Optical Constants and Electrical and Thermal Parameters as a Function of Film Thickness |
127 |
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6.2.4 Limits of Storage Density in Thin Films |
128 |
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6.3 Phase Change Nanowires |
130 |
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6.4 Phase Change Nanoparticles |
133 |
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6.5 Scaling in Time – Switching Speed of Phase Change Materials |
137 |
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References |
139 |
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7. Crystallization Kinetics |
144 |
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7.1 Theory |
144 |
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7.1.1 Homogeneous Crystal Nucleation |
144 |
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7.1.1.1 Thermodynamics of Cluster Formation (Gibbs, 1878) |
145 |
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7.1.1.2 Model Based on Equilibrium Distribution of Clusters (Volmer and Weber, 1926) |
146 |
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7.1.1.3 Steady State Model (Becker and Döring, 1935) |
147 |
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7.1.1.4 The Kinetic Pre-factor of the Nucleation Rate (Turnbull and Fisher, 1949) |
148 |
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7.1.2 Heterogeneous Crystal Nucleation |
152 |
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7.1.3 Crystal Growth |
154 |
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7.1.3.1 Interface-controlled Growth |
155 |
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7.1.3.2 Growth Controlled by Long-range Diffusion |
156 |
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7.2 Measurements |
157 |
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7.2.1 Crystallization Parameters Around the Glass Transition Temperature |
157 |
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7.2.2 Crystallization Parameters Close to the Melting Temperature |
161 |
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References |
164 |
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8. Short and Long-Range Order in Phase Change Materials |
168 |
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8.1 Historical Background |
168 |
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8.1.1 Glass Formation Process |
169 |
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8.2 Long-Range Order |
170 |
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8.2.1 GeTe |
171 |
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8.2.2 Ge-Sb-Te Alloys |
173 |
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8.2.2.1 Metastable Ge-Sb-Te Alloys |
173 |
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8.2.2.2 High-Pressure Effects on Metastable Ge-Sb-Te Alloys |
175 |
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8.2.2.3 Ge-Sb-Te Equilibrium Structures |
176 |
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8.2.2.4 Sb-Te Alloys |
177 |
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8.3 Short-Range Order |
179 |
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8.3.1 X-ray Absorption |
179 |
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8.3.1.1 Short-range Order in Crystalline GeTe |
183 |
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8.3.1.2 Short-range Order in Amorphous GeTe |
184 |
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8.3.1.3 Short-range Order in Crystalline Ge2Sb2Te5 |
186 |
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8.3.2 Short Range Order in Sb-Te Alloys |
189 |
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8.3.2.1 Conclusions |
190 |
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References |
190 |
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9. Optical and Electrical Properties of Phase Change Materials |
194 |
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9.1 Introduction |
194 |
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9.2 Optical Constants and Optical Bandgap |
195 |
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9.2.1 Determination of the Optical Constants and Absorption Coefficient |
195 |
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9.2.1.1 Transmission and Reflection Measurements |
196 |
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9.2.1.2 Ellipsometry |
196 |
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9.2.1.3 Optical Contrast between Amorphous and Crystalline Phases |
197 |
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9.2.2 Optical Bandgap |
198 |
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9.2.3 Infrared Absorption: Band Tails and Free Carrier Absorption |
200 |
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9.2.3.1 Urbach Edge |
200 |
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9.2.3.2 Free Carrier Absorption |
201 |
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9.2.4 Effects of Composition and Preparation Conditions |
201 |
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9.3 Photo-induced Effects |
203 |
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9.3.1 Photo-induced Current and Optical Nonlinearity |
203 |
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9.3.2 Photo-Oxidation |
204 |
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9.4 Conductivity and Phase Transformation |
205 |
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9.4.1 Temperature-dependence of Resistivity |
205 |
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9.4.2 Intermediate States: Percolation and Multilevel Recording |
206 |
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9.4.3 Effects of Composition and Processing Conditions |
207 |
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9.5 Electronic Transport Properties and Band Structure |
208 |
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9.5.1 Characterization of Transport Properties |
208 |
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9.5.1.1 Hall Measurements |
208 |
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9.5.1.2 Thermoelectric Effect |
209 |
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9.5.2 Hexagonal Ge2Sb2Te5 |
210 |
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9.5.3 Face-centered-cubic Ge2Sb2Te5 |
212 |
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9.5.4 Amorphous Ge2Sb2Te5 |
213 |
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9.6 Perspective for the Future |
213 |
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References |
214 |
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10. Development of Materials for Third Generation Optical Storage Media |
218 |
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10.1 Introduction |
218 |
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10.2 Requirements for a Phase-change Material |
219 |
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10.3 Why Chalcogenide Semiconductors for Optical Memory? |
221 |
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10.4 Merits and Demerits of the Te Based Eutectic Alloys |
222 |
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10.5 Merits and Demerits of the Te-based Single Phase Materials |
225 |
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10.6 From Eutectic to Single Phase Compositions |
227 |
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10.7 Discovery of the GeTe-Sb2Te3 Pseudo-binary System |
228 |
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10.8 Importance of the Cubic Structure and Vacancies |
232 |
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10.9 Secrets of the Present Phase-change Materials I |
234 |
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10.10 Materials for Blue Laser and Multi-layer Applications |
238 |
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10.11 Secrets of Present Phase-change Materials II |
241 |
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10.12 Conclusions |
242 |
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References |
243 |
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11. Novel Deposition Methods |
246 |
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11.1 Chemical Vapor Phase Deposition |
246 |
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11.2 Electrodeposition |
252 |
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11.3 Solution-phase Deposition |
257 |
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11.4 Nanomaterials |
260 |
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11.5 Conclusions |
262 |
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References |
263 |
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Part II: Applications: Optical, Solid State Memory and Reconfigurable Logic |
268 |
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12. Optical Memory: From 1st to 3rd Generation and its Future |
269 |
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12.1 Introduction |
269 |
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12.2 Three Generations of Optical Media |
270 |
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12.2.1 The First Generation: Compact Discs (CDs) |
271 |
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12.2.2 The Second Generation: Digital Versatile Disks (DVDs) |
271 |
|
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12.2.3 The Third Generation: Blu-ray Discs (BDs) |
274 |
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12.2.3.1 Blu-ray Discs |
274 |
|
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12.3 The Basic Principle of Optical Recording |
275 |
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12.4 Phase-change Optical Recording and Related Technologies |
278 |
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12.4.1 Phase-Change Optical Storage |
278 |
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12.4.1.1 Principle of Phase-Change Optical Storage |
278 |
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12.4.1.2 Phase-Change Materials |
281 |
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12.4.1.3 Development of Phase-Change Optical Storage Media |
282 |
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12.4.1.4 Disc Structure of Phase-Change Optical Disc |
285 |
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12.4.1.5 Models of Phase-Change Induced by Moving Laser Beam |
287 |
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12.4.2 Techniques for Phase-Change Optical Storage |
288 |
|
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12.4.2.1 Short Wavelength Laser Diodes |
289 |
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12.4.2.2 Large Numerical Aperture (NA) |
289 |
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12.4.2.3 Land/Groove Recording |
289 |
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12.4.2.4 Write Strategy |
290 |
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12.4.2.5 Cross Talk |
291 |
|
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12.4.2.6 Super Resolution |
292 |
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12.4.2.7 Multilevel Phase-Change Recording |
293 |
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12.4.2.8 Dual Layer Phase-change Optical Recording |
293 |
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12.4.2.9 Superlattice-like Phase-change Optical Disc |
294 |
|
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12.4.2.10 Initialization Free Phase-change Optical Disc |
295 |
|
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12.4.2.11 Near-field Phase-Change Optical Storage |
297 |
|
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12.5 The Future of Optical Storage |
297 |
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References |
300 |
|
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13. 4th Generation Optical Memories Based on Super-resolution Near-field structure (Super-RENS) and Near-field Optics |
303 |
|
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13.1 Introduction |
303 |
|
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13.2 Diffraction Limit and Near-Field Optics |
304 |
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13.3 Small Aperture and Non-propagating Photons |
306 |
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13.4 Super-resolution Near-field Structure (Super-RENS) Principle to Retrieve Non-propagating Light |
308 |
|
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13.5 Origin of the Strong Scattered Signals for 4th Generation Super-RENS Disks |
310 |
|
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13.6 Beyond Super-RENS |
314 |
|
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References |
315 |
|
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14. Phase Change Memory Device Modeling |
317 |
|
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14.1 Introduction |
317 |
|
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14.2 Device Operation |
318 |
|
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14.3 Modeling of Electrical Conduction in the Amorphous Phase |
320 |
|
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14.4 Threshold Switching in the Amorphous Chalcogenide |
324 |
|
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14.5 Modeling the Electrical Conduction in the Crystalline Chalcogenide |
326 |
|
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14.6 Electro-thermal Modeling of the Programming Characteristics |
327 |
|
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14.7 Modeling the Amorphous to Crystalline Phase Transformation |
332 |
|
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14.8 Modeling the Structural Relaxation in the Amorphous Phase |
338 |
|
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14.9 Summary and Outlook |
343 |
|
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References |
345 |
|
|
15. Phase Change Random Access Memory Advanced Prototype Devices and Scaling |
348 |
|
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15.1 Introduction |
348 |
|
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15.2 Device Scaling by Reducing the Electrode Contact Area |
349 |
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15.2.1 The Heater Structure |
350 |
|
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15.2.1.1 Additional Adhesion Layer |
351 |
|
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15.2.1.2 Size Effect of the Phase Change Material |
352 |
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15.2.1.3 Different Phase Change Materials |
353 |
|
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15.2.1.4 Process Integration Issues for Scaling |
353 |
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15.2.2 The Edge Contact Structure |
354 |
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15.2.3 ?Trench Structure |
355 |
|
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15.2.4 The Ring Structure |
355 |
|
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15.3 Device Scaling by Reducing the Phase Change Material Volume |
356 |
|
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15.3.1 The Pillar Structure |
357 |
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15.3.2 The Line Structure |
358 |
|
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15.3.3 The Bridge Structure |
359 |
|
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15.4 Other Prototype Devices |
360 |
|
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15.4.1 Scaling Both the Material and the Contact |
361 |
|
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15.4.2 Multi-level Cell |
362 |
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15.4.3 Confined Structure |
362 |
|
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15.5 Advanced Device Testing |
364 |
|
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15.6 Summary |
366 |
|
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References |
367 |
|
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16. Phase Change Memory Cell Concepts and Designs |
372 |
|
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16.1 Introduction |
372 |
|
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16.2 Technology Overview |
373 |
|
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16.3 Phase Change Memory Cell Electrical Characterization |
378 |
|
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16.4 Phase Change Memory Cell Reliability |
385 |
|
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16.4.1 Data Retention Characterization |
386 |
|
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16.4.2 Retention Behavior with Device Scaling |
393 |
|
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16.4.3 Cycling Endurance |
394 |
|
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16. 5 Summary and Outlook |
395 |
|
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References |
396 |
|
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17. Phase Change Random Access Memory Integration |
398 |
|
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17.1 Introduction |
398 |
|
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17.2 Phase Change Random Access Memory Design Basics |
399 |
|
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17.3 Review of Desired Phase Change Memory CellCharacteristics |
403 |
|
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17.4 The Access Device |
407 |
|
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17.5 Device Design Considerations |
410 |
|
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17.5.1 The Mushroom Cell without or with Bottom RingElectrode |
410 |
|
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17.5.2 The Pillar Cell |
414 |
|
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17.5.3 The ?Trench Cell |
416 |
|
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17.5.4 The Pore Cell |
416 |
|
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17.6 Multi-Level Phase Change Random Access Memory |
420 |
|
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17.7 Concluding Remarks |
423 |
|
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References |
423 |
|
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18. Reconfigurable Logic |
426 |
|
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18.1 Introduction |
426 |
|
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18.2 Digital System Basics |
427 |
|
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18.3 Simple Configurable Digital Systems |
431 |
|
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18.4 Considerations in Computation Architectures |
436 |
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18. 5 Multi-valued Systems |
437 |
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18.6 Threshold Logic |
439 |
|
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18.7 Artificial Neural Networks |
442 |
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18.8 Other Analog-domain Programmable Systems |
443 |
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18.9 Conclusions |
446 |
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References |
446 |
|
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Author Bios |
448 |
|
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Index |
454 |
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